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Authors and Affiliations

1. Applied Laser Technologies, Ruhr University Bochum, Universitätsstraße 150, 44801, Bochum, Germany

   Felix Behlau, Cemal Esen & Andreas Ostendorf

2. Applied Physics Department, University of Vigo, EEI, Lagoas-Marcosende, 36310, Vigo, Spain

   Antonio Riveiro Rodriguez & Juan Pou

Contributions

Conceptualization: JP, AR, AO & FB; methodology: FB & AR; formal analysis: FB & AR; 2PP processing: FB; dissolution test: AR & FB; ICP-MS measurement: AR; SEM imaging: FB; writing (original draft): FB; writing (review & editing): AR, CE, JP & AO; supervision: CE, JP & AO; project administration: JP, AO; funding acquisition: FB, CE, JP & AO

Corresponding author

Correspondence to Felix Behlau.

Competing interests

The authors declare no competing interests.

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